Youn nan metal wo nivo Silisyòm carbure

Karakteristik yo ki absòpsyon mikwo ond nanSilisyòm carbureSeramik may yo se prèske plis pase de fwa pi wo pase sa yo ki an materyèl solid, ak amelyorasyon nan pèfòmans sa a absòpsyon sitou soti nan diminisyon an ki te koze pa refleksyon an, simaye ak entèferans nan onn elektwomayetik ki te pwodwi pa estrikti a may. Efè yo nan gwosè pò, dansite relatif ak epesè echantiyon sou pèfòmans nan absòpsyon mikwo ond nan seramik Silisyòm carbure may yo diskite. Travay sa a pral bay yon nouvo apwòch pou konsepsyon de pri ki ba, pèfòmans-wo estriktirèl mikwo ond absòbe materyèl yo.

1.Metòd Preparasyon pou High-hardness, High-mete-Reziste Kabòn Self-DopedSilisyòm carburesemiconductor film, relates to the field of semiconductor technology, the cleaning equipment comprises an ultrasonic cleaning groove and a hanging basket matched with the ultrasonic cleaning groove, the front and back sides of the ultrasonic cleaning groove are fixedly connected with a fixing plate, the front of the ultrasonic cleaning groove is fixedly connected with a mounting plate, a driving mechanism is arranged on the mounting plate, and a shaking mechanism that is used in conjunction with the driving mechanism to drive the hanging basket to shake is arranged on the fixed plate, Through the mutual cooperation of the driving mechanism and the shaking mechanism, after the substrate is cleaned by ultrasonic, the hanging basket is jacked up and shaken back and forth, so that the liquid medicine remaining on the substrate material can be treated, and the substrate is taken out to reduce the Polisyon nan anviwònman an ki antoure.

Baj popilè: Youn nan metal wo nivo Silisyòm carbure, Lachin youn nan metal wo nivo Silisyòm manifaktirè carbure, founisè, faktori